CHN
Device Fabrication

E-beam evaporator

Source:Institute of LQM      Author:吴沁柯    Published Date:2026-03-12    Views:

  • Model (EB-500) and company (SKY Technology Development Co.,Ltd.), Location(Cleanroom)

    Superuser(Jinxia Xu),contacts (13476823697/wechat ID: hbutxujx)

  • Brief description

    E-beam evaporator is used for preparing: materials such as Au, Ti, Cr, Ag, Al, Cu, Pt, Pb, In, Mo, SiO₂, etc, and it is capable of depositing single-layer/multi-layer films. The equipment is simple and easy to control, with a large coating area and strong thin film adhesion, making it particularly suitable for materials with high melting points and high purity.

  • Specifications:   

    -Ultimate vacuum degree is about 6.6×10⁻⁵ Pa

    -Pressure holding performance: Vacuum degree after the system is shut down (pump stopped) for 12 hours: ≤5 Pa

    -Substrate size: φ6 inches, Heating temperature: ≥800 °C

    -Electron gun: Power: 10 kW, 2 sets of thermal resistance evaporation sources, Evaporation power supply: 1 unit, 6V 200A

    -Deposition Film options: Au, Ti, Cr, Ag, Al, Cu, Pt, Pb, In, Mo, SiO₂, etc.




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