Sputter for oxides

• Model (PVD500s) and company (SKY Technology Development Co.,Ltd.), Location(Cleanroom)

    Superuser(Jinxia Xu),contacts (13476823697/wechat ID: hbutxujx)

• Brief description: 

             Oxides Sputtering Thin Film Deposition System is suitable for magnetic material thin films. The multi-target inclined co-sputtering method enables the deposition of mixture/compound thin films. By introducing oxygen, nitrogen, or other reactive gases during the sputtering process, compound thin films of target materials and gas molecules can be deposited. It features simple equipment with easy control, large coating area, and strong thin film adhesion, making it particularly suitable for materials with high melting points and low vapor pressures.

• Specifications:

    -3 inch target × 4， flip chip on substrate ≤4inch

    - Vacuum degree10-6 Pa,

    Process Gas Optional

    : Ar, N2, O2; N2 (0-50 sccm), Ar (0-200sccm), O2(0-50sccm)

    - Optional heated sample stage

    : Suitable for samples of ≥4 inches,

    with a heater wire heating temperature of 800 °C

    - RF sputtering power supplies: 500 W, 4unit

    - Deposition Film options: Oxide film