Sputter for metal

• Model (PVD500s) and company (SKY Technology Development Co.,Ltd.), Location(Cleanroom)

    Superuser(Jinxia Xu),contacts (13476823697/wechat ID: hbutxujx)

• Brief description: 

            Metal Sputtering Thin Film Deposition System is suitable for magnetic material thin films. The multi-target inclined co-sputtering method enables the deposition of mixture/compound thin films.By introducing oxygen, nitrogen, or other reactive gases during thesputtering process, compound thin films of target materials and gasmolecules can be deposited. It features simple equipment with easy control, large coating area, and strong thin film adhesion, making it particularly suitable for materials with high melting points and low vapor pressures.

• Specifications:

    -3 inch target × 4， flip chip on substrate ≤4inch vacuum degree 8.0×10⁻⁶ Pa Process Gas Optional: Ar, N2,O2;

    -N2 (0-50 sccm), Ar (0-200sccm), O2 (0-50sccm)

    -Optional heated sample stage

    : Suitable for samples of ≥4 inches

    : with a heater wire heating temperature of 800 °C DC sputtering power supplies

    : 500 W, 3 units, RF sputtering power supplies: 500 W, 1 unit Deposition Film options: metal film