CHN
Device Fabrication

Mask aligner

Source:Institute of LQM      Author:吴沁柯    Published Date:2026-03-12    Views:

  • Model(URE-2000/34AL)and company (中科院光电技术研究所), Location (Cleanroom)

    Superuser (Jingjing Lu/Zhuo Peng), Contacts (15377533309/wechat ID: miaomer_777、18672798545/wechat ID: pzpzpz1993)

  • Brief description

    The mask aligner URE-2000/34AL is a proximity contact lithography machine, which is essential in research fields such as materials science and electronic device fabrication. It is primarily used for manufacturing small-scale integrated circuits, semiconductor devices, infrared devices, surface acoustic wave devices, micro-electromechanical systems (MEMS), microfluidic systems, and more. It features user-friendly operation, stable performance, and high reliability.

  • Specifications:

    -wavelength:365 nm;UV- LED light source

    -Illuminance inhomogeneity up to 2.5% (Φ150mm)

    -Resolution up to 0.8 ~ 1μm;

    -Alignment down to 0.8 ~ 1μm ;

    -Stand-alone system for wafer sizes up to 150 mm/6’’




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