Source:Institute of LQM Author:吴沁柯 Published Date:2026-03-12 Views:
Model(URE-2000/34AL)and company (中科院光电技术研究所), Location (Cleanroom)
Superuser (Jingjing Lu/Zhuo Peng), Contacts (15377533309/wechat ID: miaomer_777、18672798545/wechat ID: pzpzpz1993)
Brief description:
The mask aligner URE-2000/34AL is a proximity contact lithography machine, which is essential in research fields such as materials science and electronic device fabrication. It is primarily used for manufacturing small-scale integrated circuits, semiconductor devices, infrared devices, surface acoustic wave devices, micro-electromechanical systems (MEMS), microfluidic systems, and more. It features user-friendly operation, stable performance, and high reliability.
Specifications:
-wavelength:365 nm;UV- LED light source
-Illuminance inhomogeneity up to 2.5% (Φ150mm)
-Resolution up to 0.8 ~ 1μm;
-Alignment down to 0.8 ~ 1μm ;
-Stand-alone system for wafer sizes up to 150 mm/6’’
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