Source:Institute of LQM Author:宋兴娟 Published Date:2026-03-12 Views:
Model (µMLA ) and company (Heidelberg), Location (Cleanroom)
Superuser (Xingjuan Song), contacts (15527359929/wechat ID: juan921217826)
Brief description:
It is a versatile tabletop direct laser lithography system that eliminates the need for physical photomasks, enabling highly efficient and precise micro-patterning for research and development.
Specifications:
- Maximum substrate size:155 mm x 155 mm (1 kV )
- Minimum substrate size:5 x 5 mm2
-Maximum write area:150 x 150 mm2
-Substrate thickness:0.1 to 15 mm
-Minimum Feature Size: 1 μm
-Minimum Lines and Spaces:1.5μm
-Overlay accuracy@50 x 50mm2:1000nm
Next:Mask aligner
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