CHN
Device Fabrication

Pattern generator (laser writing)

Source:Institute of LQM      Author:宋兴娟    Published Date:2026-03-12    Views:


  • Model (µMLA ) and company (Heidelberg), Location (Cleanroom)

    Superuser (Xingjuan Song), contacts (15527359929/wechat ID: juan921217826)

  • Brief description

It is a versatile tabletop direct laser lithography system that eliminates the need for physical photomasks, enabling highly efficient and precise micro-patterning for research and development.

  • Specifications:

    - Maximum substrate size:155 mm x 155 mm (1 kV )

    - Minimum substrate size:5 x 5 mm2

    -Maximum write area:150 x 150 mm2

    -Substrate thickness:0.1 to 15 mm

    -Minimum Feature Size: 1 μm

    -Minimum Lines and Spaces:1.5μm

    -Overlay accuracy@50 x 50mm2:1000nm


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