Source:Institute of LQM Author:吴沁柯 Published Date:2026-03-12 Views:
Model (JSM-IT810) and company (JEOL), Location (Structural Characterization Room 1)
Superuser (Xiang Xing), contacts (18040516270/wechat ID: yiyunjin16)
Brief description: It is mainly used for electron microanalysis of various materials, such as metals, nonmetals, nanomaterials and semiconductor materials etc. It can obtain ultra-high resolution SEI/BEI and EDS/EBSD analysis of the samples under high vacuum conditions
Specifications
- Secondary electron image resolution: ≤0.6 nm (15 kV);≤1.1 nm (1 kV )
- Resolution during analysis: ≤3.0 nm (15 kV, 10 mm WD, 5 nA)
- Probe Voltage:0.01 to 30 kV
- Magnification: ×10 to 2,000,000
- Loadable specimen size: ≥170 mm (dia.) × 45 mm (H) (5 mm WD)
- EDS: an effective area of 60mm2 for Detector
- EBSD: online parsing has a maximum calibration speed of 600pps, and the pattern resolution can still be maintained at 312 * 256
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