Associate ProfessorTel：
Email：jontydip@gmail.com
IntroductionDr. Dipayan Pal is an Associate Professor in the School of Materials and Chemical Engineering at Hubei University of Technology, working at the forefront of next-generation semiconductor materials and device technologies. He earned his Ph.D. in Materials Science from the Indian Institute of Technology Indore, where he developed strong expertise in thin films, interfaces, and advanced functional materials for application in rechargeable batteries. He further broadened his international research profile through postdoctoral research at Sungkyunkwan University, South Korea, and at the University of California, San Diego, USA. His work has focused extensively on atomic layer deposition, low-dimensional materials, semiconductor thin films, and advanced integration strategies for future logic, memory, and 3D electronic devices. Dr. Pal has made significant contributions to both fundamental materials science and application-driven semiconductor research through collaborations with leading academic and industrial partners. He has authored more than 30 research publications, reflecting a strong record of innovation and translational research. With an h-index of 10, his research has gained growing recognition in the fields of materials science, nanotechnology, and semiconductor engineering. His current research interests center on high-performance next-generation 2D semiconductors and advanced materials for logic and RF applications.
Education Experience(1) Ph.D. in Metallurgy Engineering and Materials Science, Indian Institute of Technology Indore, India; July 2014 to November 2019.
(2) Master of Science in Physics, Indian Institute of Technology Hyderabad, India; July 2012 to May 2014.
(3) Bachelor of Science in Physics, University of Calcutta, India; July 2009 to July 2012.
Work Experience(1) Associate Professor, Institute of Low-Dimensional Quantum Materials, School of Materials and Chemical Engineering, Hubei University of Technology; March 2026 to Present.
(2) Postdoctoral Scholar Employee at University of California San Diego, USA; June 2023 to December 2025.
(3) Postdoc Researcher at Sungkyunkwan University, South Korea; June 2022 to May 2023.
(4) Research Associate-I at Centre for Nano and Soft Matter Sciences, India; March 2021 to May 2022.
(5) Institute Post-Doctoral Fellow at Indian Institute of Technology Indore, India; June 2019 to June 2020.
Low-dimensional semiconductor materials, thin-film growth, surface and interface engineering, developing high-performance next-generation 2D semiconductors for logic and RF applications.
A. Selected Publications:
1. D. Pal*, J. Dutta, D. C. Mora, J. Mu, X. Wang, D. Go, A. E. Ross, A. C. Kummel, “Grain-Size Engineering in Vapor-Deposited ZIF‑8 MOF: Low-Leakage Low‑k Films with Enhanced Breakdown Field”, ACS Applied Materials & Interfaces, 2026, (doi.org/10.1021/acsami.6c00629).
2. C-H Kuo, J. Dutta, H. Ko, D. Pal, M. Manley, R. Sahay, D. Baig, M. Bakir, C. H. Winter, C. V. Thompson, A. C. Kummel, “Cyclic Oxidation–Reduction Cleaning for Microstructural and Chemical Restoration of Copper after Chemical Mechanical Polishing”, ACS Applied Electronic Materials 8, 1588, 2026, (doi.org/10.1021/acsaelm.5c02225).
3. J. Mu, X. Wang, J. Huang, C. H. Winter, K. Wang, D. Pal, P-C Lee, D. C. Mora, J. Dutta, A. Yadav, K. Wong, S. Nemani, E. Yieh, A. C. Kummel, “Air-Stable Low Dielectric Constant SiOx/AlOx Nanolaminate Films Deposited by Thermal Pulsed Chemical Vapor Deposition with Continuous Carbon Doping For Interlayer Dielectric” ACS Applied Nano Materials 8, 16926, 2025 (doi.org/10.1021/acsanm.5c03189)
4. D. Pal*, N. Yang, H. Simka, J. Dutta, K. Wang, J. Mu, P-C Lee, X. Wang, C. H. Winter, and A. C. Kummel, “Vapor-deposited MOF for low-k dielectric seamless high-aspect-ratio interconnect gap fill”, ACS Applied Materials & Interfaces 17, 14682, 2025, (doi.org/10.1021/acsami.4c20795).
5. P-C Lee, A. J. McLeod, M. Choi, D. Vaca, D. C. Mora, K. Wang, S. Yun, J. Dutta, D. Pal, S. Kumar, A. C. Kummel, “Achieving a High Thermally Conductive One Micron AlN Deposition by High Power Impulse Magnetron Sputtering plus Kick”, ACS Applied Materials & Interfaces 16, 26664, 2024, (doi.org/10.1021/acsami.4c00993).
6. R. Rathod, S. Kapse, D. Pal, M. R. Das, R. Thapa, P. K. Santra, “Restricting Anion Migrations by Atomic Layer-Deposited Alumina on Perovskite Nanocrystals while Preserving Structural and Optical Properties”, Chemistry of Materials 36, 1719, 2024, (doi.org/10.1021/acs.chemmater.3c03113).
7. R. Roy, M. K. Ganesha, P. Dutta, D. Pal, A. K. Singh, “High-Performance Aqueous Electrochromic Battery for Smart Window Application: Mechanistic Insights of Al-Ion (De) Intercalation Kinetics in Thickness-Optimized WO3”, ACS Applied Energy Materials 6, 11683, 2023 (doi.org/10.1021/acsaem.3c02237).
8. S. Chattopadhyay, V. Munya, R. Kumar, D. Pal, S. Bandyopadhyay, A. Ghosh, P. Yogi, J. Koch, H. Pfnür, “F4-TCNQ on Epitaxial Bi-Layer Graphene: Concentration- and Orientation-Dependent Charge at the Interface”, Langmuir 38, 16067, 2022, (doi.org/10.1021/acs.langmuir.2c02676).
9. D. Pal, S. Chakraborty, S. Chattopadhyay, “Recent Progress in Al-, K-, and Zn-Ion Batteries: Experimental and Theoretical Viewpoints”, Energy Technology 9, 2100382, 2021, (doi.org/10.1002/ente.202100382).
10. D. Pal, A. Mathur, A. Singh, S. Pakhira, R. Singh, S. Chattopadhyay, “Binder-Free ZnO Cathode synthesized via ALD by Direct Growth of Hierarchical ZnO Nanostructure on Current Collector for High-Performance Rechargeable Aluminium-Ion Batteries”, ChemistrySelect 3, 12512, 2018, (doi.org/10.1002/slct.201803517).
11. D. Pal, J. Singhal, A. Mathur, A. Singh, S. Dutta, S. Zollner, S. Chattopadhyay, “Effect of Substrates and Thickness on Optical Properties in Atomic Layer Deposition Grown ZnO Thin Films”, Applied Surface Science 421, 341, 2017, (doi.org/10.1016/j.apsusc.2016.10.130).
12. A. Singh, S. Schipmann, A. Mathur, D. Pal, A. Sengupta, U. Klemradt, S. Chattopadhyay, “Structure and morphology of magnetron sputter deposited ultrathin ZnO films on confined polymeric template”, Applied Surface Science 414, 114, 2017, (doi.org/10.1016/j.apsusc.2017.04.078).
13. D. Pal, A. Mathur, A. Singh, J. Singhal, A. Sengupta, S. Dutta, S. Zollner, S. Chattopadhyay, “Tunable Optical Properties in Atomic Layer Deposition grown ZnO Thin Films”, Journal of Vacuum Science & Technology A 35, 01B108, 2017, (doi.org/10.1116/1.4967296).
14. A. Mathur, S. B. Dutta, D. Pal, J. Singhal, A. Singh, S. Chattopadhyay, “High Efficiency Epitaxial-Graphene/Silicon-Carbide Photocatalyst with Tunable Photocatalytic Activity and Bandgap Narrowing”, Advanced Materials Interfaces 3, 1600413, 2016, (doi.org/10.1002/admi.201600413).
B. Book chapter:
1. D. Pal, S. Chattopadhyay, “Surface and interface effects: properties of nanostructured ZnO”, invited book chapter, Nanostructured Zinc oxide, Elsevier Science & Technology 2021, (doi.org/10.1016/B978-0-12-818900-9.00009-7).
1. Award of INSPIRE Scholarship during Bachelor and Master from Department of Science & Technology (DST), Government of India, 2009 to 2014.
2. Award of Teaching Assistant (TA) Fellowship for Ph.D. from Ministry of Human Resource Development (MHRD), Government of India, 2014 to 2018.
3. Research fellow at Semiconductor Research Corporation (SRC), USA, June 2023 to December 2025.
4. Samsung fellowship at UC San Diego, USA, from June 2023 to December 2025.
5. Working as peer reviewer for several international Physics and Materials Science related journals.
Copyright © 2025 Institute of Low-Dimensional Quantum Materials, Hubei University of Technology.
